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Packaging Vacuum Gr2 Titanium Sputtering Targets 78.99OD*45
| Place of Origin | Baoji, Shaanxi, China |
|---|---|
| Brand Name | Feiteng |
| Certification | GB/T19001-2016 idt ISO9001:2015 GJB9001C-2017 |
| Model Number | Titanium Target |
| Minimum Order Quantity | To be negotiated |
| Price | To be negotiated |
| Packaging Details | Vacuum package in wooden case |
| Delivery Time | To be negotiated |
| Payment Terms | T/T |
| Supply Ability | To be negotiated |
Product Details
| Brand Name | Feiteng | Model Number | Titanium Target |
|---|---|---|---|
| Certification | GB/T19001-2016 Idt ISO9001:2015 MANAGEMENT SYSTEM CNAS C034-M | Grade | Titanium Gr2 |
| Size | φ78.99*45mm | Packaging | Vacuum Package |
| Place Of Origin | Baoji, Shaanxi, China | ||
| High Light | Gr2 Titanium Sputtering Targets,Packaging Vacuum titanium sputtering targets,45mm Sputtering Targets |
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Product Description
Titanium Target Target Materials Titanium Gr2 78.99OD*45 Sputtering Materials Packaging Vacuum
| Product | Titanium target |
| Size | φ78.99*45 mm |
| Grade | Titanium Gr2 |
| Packaging | Vacuum package |
| Port of delivery | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
Purity is one of the main performance indexes of the target material, because the purity of the target material has a great influence on the properties of the film. However, in practical application, the purity requirements of the target material are also different. The impurities in the solid material and the oxygen and water vapour in the pores are the main sources of film deposition. In order to reduce the porosity in the solid of the target material and improve the properties of the sputtered film, the target material is usually required to have a higher density. The density of the target material affects not only the sputtering rate, but also the electrical and optical properties of the films. The higher the density of the target material, the better the film performance. In addition, the density and strength of the target material can be improved so that the target material can better bear the thermal stress in the sputtering process. Density is also one of the key performance indexes of the target material.
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