Feiteng Magnetron Cr Sputtering Target OD127*ID458*10

Place of Origin Baoji, Shaanxi, China
Brand Name Feiteng
Certification GB/T19001-2016 idt ISO9001:2015; GJB9001C-2017
Model Number Titanium tube target
Minimum Order Quantity To be negotiated
Price To be negotiated
Packaging Details Vacuum package in wooden case
Delivery Time To be negotiated
Payment Terms T/T
Supply Ability To be negotiated
Product Details
Pure Pure>3N5 Certification GB/T19001-2016 Idt ISO9001:2015; GJB9001C-2017
Brand Name Feiteng Packaging Vacuum Package In Wooden Case
Model Number Chromium Plate Target Place Of Origin Baoji, Shaanxi, China
Size 127*458*10
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Feiteng Cr Sputtering Target


Magnetron Cr Sputtering Target 127mm


10mm Magnetron sputtering target

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Product Description

Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target

 Item name

 Chromium Plate target

 Size  OD127*ID458*10
 Pure  Pure>3N5
 Packaging  Vacuum package in wooden case
 Port of place  Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port

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Chromium (Chromium), chemical symbol Cr, atomic number 24, in the periodic table belongs to group ⅵ B. The element name comes from the Greek word for "color," because chromium compounds are colored. Steel gray metal is the hardest metal in nature. Chromium, at 0.01% in the earth's crust, ranks 17th. Free natural chromium is extremely rare and occurs mainly in chromium-lead ore. In the metallurgical industry, chromite is mainly used to produce ferrochrome alloy and chromium metal. Chromium is used in stainless steel, auto parts, tools, tape and videotape. Chrome plated on metal can be rust-resistant, also known as Cordometer, strong and beautiful.
Chromium is an essential trace element in human body. Trivalent chromium is a healthy element, while hexavalent chromium is toxic. The absorption and utilization rate of inorganic chromium by human body is very low, less than 1%. The human body's utilization rate of organic chromium can reach 10-25%. The content of chromium in natural food is low and exists in the form of trivalent.


The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate technological conditions. To put it simply, the target material is the target material of high-speed charged particles bombardment. When used in high-energy laser weapons, different power densities, different output waveforms and different wavelengths of laser interact with different targets, different killing and destruction effects will be produced.

1) Magnetron sputtering principle:
An orthogonal magnetic field and electric field are added between the sputtered target pole (cathode) and anode, and the required inert gas (usually Ar gas) is filled in a high vacuum chamber. The permanent magnet forms a magnetic field of 250 ~ 350 Gauss on the surface of the target material, which forms an orthogonal electromagnetic field with the high voltage electric field. Under the action of electric field, Ar gas ionization into positive ions and electrons, target and has certain negative pressure, from the action of the target from the extremely affected by magnetic field and increase of working gas ionization probability, form a high density plasma near the cathode, Ar ion under the action of lorentz force, speed up to fly to the target surface, bombarding target surface at a high speed, The sputtered atoms on the target follow the momentum conversion principle and fly away from the target with high kinetic energy to the substrate for film deposition. Magnetron sputtering is generally divided into two kinds: DC sputtering and rf sputtering. The principle of DC sputtering equipment is simple, and the rate is fast when sputtering metal. Rf sputtering is more widely used, in addition to sputtering conductive materials, also can sputter non-conductive materials, but also reactive sputtering to prepare oxides, nitrogen and carbide and other compound materials. If the frequency of radio frequency is increased, it becomes microwave plasma sputtering. Now, the electron cyclotron resonance (ECR) type microwave plasma sputtering is commonly used.
2) Magnetron sputtering target type:
Metal sputtering target material, coating alloy sputtering coating material, ceramic sputtering coating material, boride ceramic sputtering target materials, carbide ceramic sputtering target material, fluoride ceramic sputtering target material, nitride ceramic sputtering target materials, oxide ceramic target, selenide ceramic sputtering target material, silicide ceramic sputtering target materials, sulfide ceramic sputtering target material, telluride ceramic sputtering target material, Other ceramic targets, chromium-doped silicon monoxide ceramic target (CR-SiO), indium phosphating target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).


Feiteng Magnetron Cr Sputtering Target OD127*ID458*10 0



1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance