GMR Films Gr2 Sputtering Tube Targets For Magneto Optical Disc

Place of Origin Baoji, Shaanxi, China
Brand Name Feiteng
Certification GB/T19001-2016 idt ISO9001:2015; GJB9001C-2017
Model Number Titanium tube target
Minimum Order Quantity To be negotiated
Price To be negotiated
Packaging Details Vacuum package in wooden case
Delivery Time To be negotiated
Payment Terms T/T
Supply Ability To be negotiated
Product Details
Certification GB/T19001-2016 Idt ISO9001:2015; GJB9001C-2017 Brand Name Feiteng
Model Number Titanium Tube Target Packaging Vacuum Package In Wooden Case
Place Of Origin Baoji, Shaanxi, China Grade Gr2
Specification ASTM B861-06 A Size φ133*φ125*2140
High Light

Gr2 Sputtering Tube Targets


GMR Films Tube Targets


ASTM B861 Gr2 Tube Target

Leave a Message
Product Description

Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Target Sputtering

 Item name

 Titanium tube target

 Size  φ133*φ125*2140
 Grade  Gr2
 Packaging Wooden case
 Port of place  Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port


The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate technological conditions. To put it simply, the target material is the target material of high-speed charged particles bombardment. When used in high-energy laser weapons, different power densities, different output waveforms and different wavelengths of laser interact with different targets, different killing and destruction effects will be produced. Among all the application industries, the semiconductor industry has the most stringent quality requirements for target sputtering films. Today, 12-inch (300 epistaxis) silicon chips have been made. The interconnects are shrinking in width. Wafer manufacturers require large size, high purity, low segregation and fine grain, which requires better microstructure of the manufactured target. The crystal particle diameter and uniformity of target material have been considered as the key factors affecting the deposition rate of thin films. In the aspect of storage technology, the development of high-density and large-capacity hard disks requires a large number of GMR films. CoF~Cu multilayer composite films are now widely used in GMR films. The TbFeCo alloy target material needed for the magneto-optical disc is still being further developed. The magneto-optical disc made with it has the characteristics of large storage capacity, long service life and repeated non-contact erasable writing.


GMR Films Gr2 Sputtering Tube Targets For Magneto Optical Disc 0





1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance