Feiteng Dia 125MM Dense Titanium Tube Targets ASTM B861-06A

Place of Origin Baoji, Shaanxi, China
Brand Name Feiteng
Certification GB/T19001-2016 idt ISO9001:2015; GJB9001C-2017
Model Number Titanium tube target
Minimum Order Quantity To be negotiated
Price To be negotiated
Packaging Details Vacuum package in wooden case
Delivery Time To be negotiated
Payment Terms T/T
Supply Ability To be negotiated
Product Details
Place Of Origin Baoji, Shaanxi, China Brand Name Feiteng
Model Number Titanium Tube Target Packaging Vacuum Package In Wooden Case
Specification ASTM B861-06 A Grade Gr2
Certification GB/T19001-2016 Idt ISO9001:2015; GJB9001C-2017 Size φ133*φ125*2140
High Light

Dia125MM Dense Titanium Tube Targets


Feiteng Dense Titanium Tube Targets


Titanium Tube Target ASTM B861-06A

Leave a Message
Product Description

Titanium Tube Target ASTM B861-06 a 133OD*125ID*2140L Titanium Gr2 Vacuum Coating Target

 Item name

 Titanium tube target

 Size  φ133*φ125*2140
 Grade  Gr2
 Packaging  Vacuum package in wooden case
 Port of place  Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port

The properties of titanium are closely related to temperature, morphology and purity. Dense titanium is fairly stable in nature, but powder titanium can cause spontaneous combustion in air. The presence of impurities in titanium significantly affects the physical, chemical, mechanical properties and corrosion resistance of titanium.


The coating target is a sputtering source. Under suitable conditions, various functional films are formed on the substrate by magnetron sputtering, multi arc ion plating or other types of coating systems. Principle of magnetron sputtering:
An orthogonal magnetic field and electric field are added between the sputtering target electrode (cathode) and the anode, and the required inert gas (usually Ar gas) is filled in the high vacuum chamber. A 250~350 Gauss magnetic field is formed on the target surface of the permanent magnet, forming an orthogonal electromagnetic field with the high voltage electric field. 2) magnetron sputtering target type:
Metal sputtering target, coating alloy sputtering target, ceramic sputtering target, boride ceramic sputtering target, carbide ceramic sputtering target, fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, selenite ceramic sputtering target, silicide ceramic sputtering target, sulfide ceramic sputtering target, tellurium ceramic sputtering target Other ceramic targets, chromium doped silica ceramic target (CR-SiO), InP target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).

Feiteng Dia 125MM Dense Titanium Tube Targets ASTM B861-06A 0



1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance