All Products
Contact Person :
Hang Ning
Phone Number :
+86 15009270259
Feiteng Dia 125MM Dense Titanium Tube Targets ASTM B861-06A
| Place of Origin | Baoji, Shaanxi, China |
|---|---|
| Brand Name | Feiteng |
| Certification | GB/T19001-2016 idt ISO9001:2015; GJB9001C-2017 |
| Model Number | Titanium tube target |
| Minimum Order Quantity | To be negotiated |
| Price | To be negotiated |
| Packaging Details | Vacuum package in wooden case |
| Delivery Time | To be negotiated |
| Payment Terms | T/T |
| Supply Ability | To be negotiated |
Product Details
| Place Of Origin | Baoji, Shaanxi, China | Brand Name | Feiteng |
|---|---|---|---|
| Model Number | Titanium Tube Target | Packaging | Vacuum Package In Wooden Case |
| Specification | ASTM B861-06 A | Grade | Gr2 |
| Certification | GB/T19001-2016 Idt ISO9001:2015; GJB9001C-2017 | Size | φ133*φ125*2140 |
| High Light | Dia125MM Dense Titanium Tube Targets,Feiteng Dense Titanium Tube Targets,Titanium Tube Target ASTM B861-06A |
||
Product Description
Titanium Tube Target ASTM B861-06 a 133OD*125ID*2140L Titanium Gr2 Vacuum Coating Target
| Item name |
Titanium tube target |
| Size | φ133*φ125*2140 |
| Grade | Gr2 |
| Packaging | Vacuum package in wooden case |
| Port of place | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
The properties of titanium are closely related to temperature, morphology and purity. Dense titanium is fairly stable in nature, but powder titanium can cause spontaneous combustion in air. The presence of impurities in titanium significantly affects the physical, chemical, mechanical properties and corrosion resistance of titanium.
The coating target is a sputtering source. Under suitable conditions, various functional films are formed on the substrate by magnetron sputtering, multi arc ion plating or other types of coating systems. Principle of magnetron sputtering:
An orthogonal magnetic field and electric field are added between the sputtering target electrode (cathode) and the anode, and the required inert gas (usually Ar gas) is filled in the high vacuum chamber. A 250~350 Gauss magnetic field is formed on the target surface of the permanent magnet, forming an orthogonal electromagnetic field with the high voltage electric field. 2) magnetron sputtering target type:
Metal sputtering target, coating alloy sputtering target, ceramic sputtering target, boride ceramic sputtering target, carbide ceramic sputtering target, fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, selenite ceramic sputtering target, silicide ceramic sputtering target, sulfide ceramic sputtering target, tellurium ceramic sputtering target Other ceramic targets, chromium doped silica ceramic target (CR-SiO), InP target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).
Features
1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance
Recommended Products