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OEM ODM 133* 125*2140mm Coating Tube Targets
| Place of Origin | Baoji, Shaanxi, China |
|---|---|
| Brand Name | Feiteng |
| Certification | GB/T19001-2016 idt ISO9001:2015; GJB9001C-2017 |
| Model Number | Titanium tube target |
| Minimum Order Quantity | To be negotiated |
| Price | To be negotiated |
| Packaging Details | Vacuum package in wooden case |
| Delivery Time | To be negotiated |
| Payment Terms | T/T |
| Supply Ability | To be negotiated |
Product Details
| Model Number | Titanium Tube Target | Place Of Origin | Baoji, Shaanxi, China |
|---|---|---|---|
| Brand Name | Feiteng | Packaging | Vacuum Package In Wooden Case |
| Certification | GB/T19001-2016 Idt ISO9001:2015; GJB9001C-2017 | Specification | ASTM B861-06 A |
| Grade | Gr2 | Size | φ133*φ125*2140 |
| High Light | 133* 125*2140mm Coating Tube Targets,OEM ODM Coating Tube Targets,125mm Vacuum Coating Target |
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Product Description
Titanium Tube Target 133OD*125ID*2140L Titanium Gr2 ASTM B861-06 a Vacuum Coating Target
| Item name |
Titanium tube target |
| Size | φ133*φ125*2140 |
| Grade | Gr2 |
| Packaging | Vacuum package in wooden case |
| Port of place | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating system under appropriate technological conditions. Magnetron sputtering principle:
An orthogonal magnetic field and electric field are added between the sputtered target pole (cathode) and anode, and the required inert gas (usually Ar gas) is filled in a high vacuum chamber. The permanent magnet forms a magnetic field of 250 ~ 350 Gauss on the surface of the target material, which forms an orthogonal electromagnetic field with the high voltage electric field. 2) Magnetron sputtering target type:
Metal sputtering target material, coating alloy sputtering coating material, ceramic sputtering coating material, boride ceramic sputtering target materials, carbide ceramic sputtering target material, fluoride ceramic sputtering target material, nitride ceramic sputtering target materials, oxide ceramic target, selenite ceramic sputtering target material, silicide ceramic sputtering target materials, sulfide ceramic sputtering target material, tellurium ceramic sputtering target material, Other ceramic target, Chromium-doped silicon monoxide ceramic target (CR-SiO), Indium phosphatizing target (InP), Lead arsenide target (PbAs), indium arsenide target (InAs).
Features
1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance
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