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Physical Vapor Deposition CGD Ti Gr2 Tube Targets For Displayer
| Place of Origin | Baoji, Shaanxi, China |
|---|---|
| Brand Name | Feiteng |
| Certification | GB/T19001-2016 idt ISO9001:2015 GJB9001C-2017 |
| Model Number | Titanium tube target |
| Minimum Order Quantity | To be negotiated |
| Price | To be negotiated |
| Packaging Details | Vacuum package in wooden case |
| Delivery Time | To be negotiated |
| Payment Terms | T/T |
| Supply Ability | To be negotiated |
Product Details
| Grade | Gr2 | Packaging | Vacuum Package In Wooden Case |
|---|---|---|---|
| Color | Shine With Grey Or Dark Grey Metallic Luster | Application | Semiconductor,electronic,displayer,etc |
| Place Of Origin | Baoji, Shaanxi, China | Standard | ASTM B861-06 A |
| Certification | GB/T19001-2016 Idt ISO9001:2015 GJB9001C-2017 | Shape | Tube |
| High Light | CGD Ti Gr2 Tube Targets,Physical Vapor Deposition Tube Targets,125mm Tube Targets For Displayer |
||
Product Description
133OD*125ID*2940L Include Flange Titanium Tube Target Titanium Gr2 ASTM B861-06 a The Target Material Vacuum Coating
| Name | Titanium tube target |
| Standard |
ASTM B861-06 a |
|
Transport Package |
Vacuum package in wooden case |
|
Origin |
Baoji, Shaanxi, China |
|
Port of deliver |
Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
| Size | φ133*φ125*2940(include flange) |
The development trend of tube target technology is closely related to the development trend of thin film technology in downstream industries. Vacuum coating technology is generally divided into two types: physical vapor deposition (PVD) and chemical vapor deposition (CVD).
Physical vapor deposition (CGD) is a method of directly depositing the coating material into atoms, molecules or separated ions into the surface of the substrate by using various physical methods under vacuum. The preparation of hard film is mainly by physical vapor deposition. It can realize the controllable transfer process of atoms from source materials to thin films by using the physical processes such as the thermal evaporation of materials or the sputtering of atoms on the material surface by ion bombardment. Physical vapor deposition technology has the advantages of good adhesion between film and substrate, uniform and dense film, controllable film thickness, wide target width, wide sputtering range, thick film deposition, stable alloy film preparation and good repeatability. At the same time, the physical vapor deposition technology can be used as the final processing technology of high speed steel and cemented carbide thin film cutter, because the processing temperature can be controlled below 500 degrees Celsius. The application of physical vapor deposition technology can greatly improve the cutting performance of cutting tools. In developing high performance and high reliability equipment, its application fields have also been expanded, especially in high-speed steel, cemented carbide and ceramic cutting tools.
The application of physical vapor deposition technology can greatly improve the cutting performance of cutting tools. In developing high performance and high reliability equipment, its application fields have also been expanded, especially in high-speed steel, cemented carbide and ceramic cutting tools.
Main advantages
Low density high specification strength
Custom request customization
Excellent corrosion resistance
Good heat resistance
Excellent low temperature performance
Good thermal properties
Low elastic modulus
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