Feiteng 155*φ125*888 Copper Target Semiconductor
|Place of Origin||Baoji, Shaanxi, China|
|Certification||GB/T19001-2016 idt ISO9001:2015 GJB9001C-2017|
|Model Number||Copper Tube Target|
|Minimum Order Quantity||To be negotiated|
|Price||To be negotiated|
|Packaging Details||Vacuum package in wooden case|
|Delivery Time||To be negotiated|
|Supply Ability||To be negotiated|
|Brand Name||Feiteng||Model Number||Copper Tube Target|
|Certification||GB/T19001-2016 Idt ISO9001:2015 MANAGEMENT SYSTEM CNAS C034-M||Place Of Origin||Baoji, Shaanxi, China|
Feiteng Copper Target,
888mm Copper Target,
155mm tube Target Semiconductor
Copper Tube Target 155OD*125ID*888 oxygen-free copper
There is often a word in the semiconductor industry, target material, semiconductor material can be divided into wafer material and packaging material, packaging material has a relatively low technical barrier compared to wafer manufacturing materials.There are seven kinds of semiconductor materials and chemicals involved in the production of wafers, one of which is the sputtering target material. To put it simply, the target material is the target material bombarded by high speed charged particles. By changing different target materials (such as aluminum, copper, stainless steel, titanium, nickel target, etc.), different film systems (such as superhard, wear-resistant, anti-corrosion alloy film, etc.) can be obtained.
|Product||Copper Tube Target|
|Packaging||Vacuum package in wooden case|
|Port of delivery||Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port|
According to different application fields, it can be divided into: semiconductor chip target, flat panel display target, solar cell target, information storage target, modified target, electronic device target and other target.
Purity is the target material‘s’ one of the main performance indexes, because the purity of the target material has a great influence on the properties of the film.However, in practical application, the target material purity requirements are also different.The impurities in the solid material and the oxygen and water vapor in the pores are the main sources of film deposition.In order to reduce the porosity in the solid of the target material and improve the properties of the sputtered film, the target material is usually required to have a higher density.The density of the target material affects not only the sputtering rate but also the electrical and optical properties of the films.The higher the density of the target material, the better the film performance.In addition, the density and strength of the target material can be improved so that the target material can better bear the thermal stress in the sputtering process.
Baoji Feiteng Metal materials Co., Ltd. are a manufacturer that locted in Baoji, Shaanxi. Therefore, you can customize any titanium, titanium alloy and other non-ferrous metal products. You could give us drawing, then we will manufacture according to the drawing. The price and delivery time can negotiate with us. we will be best to offer you a discount and the best delivery time. We usually use wooden cases for packing, but we can change way of packing as per your request. Please send e-mail to us if you want to know more details.