ASTM B861-06A Gr2 Titanium Tube Target OD150mm L1091mm

Place of Origin Baoji, Shaanxi, China
Brand Name Feiteng
Certification GB/T19001-2016 idt ISO9001:2015 GJB9001C-2017
Model Number Titanium Tube Target
Minimum Order Quantity To be negotiated
Price To be negotiated
Packaging Details Vacuum package in wooden case
Delivery Time To be negotiated
Payment Terms T/T
Supply Ability To be negotiated
Product Details
Brand Name Feiteng Model Number Titanium Tube Target
Size φ150*φ125*1091mm Certification GB/T19001-2016 Idt ISO9001:2015 MANAGEMENT SYSTEM CNAS C034-M
Place Of Origin Baoji, Shaanxi, China Packaging Vacuum Package
Weld Line Seamless
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ASTM B861-06A Gr2 Titanium Tube Target


Titanium Tube Target 150OD


1091L Gr2 Tube Target

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Product Description

Titanium Tube Target 150OD*125ID*1091L ASTM B861-06 a

There is often a word in the semiconductor industry, target material, semiconductor material can be divided into wafer material and packaging material, packaging material has a relatively low technical barrier compared to wafer manufacturing materials.There are seven kinds of semiconductor materials and chemicals involved in the production of wafers, one of which is the sputtering target material. The target material is the target material bombarded by high speed charged particles. By changing different target materials (such as titanium, copper, stainless steel, aluminium, nickel target, etc.), different film systems (such as superhard, wear-resistant, anti-corrosion alloy film, etc.) can be obtained.


At present, (purity) sputtering targets can be divided into:

1) Metal target material (pure metal aluminum, titanium, copper, tantalum, etc.)

2) Alloy target material (Ni-Cr alloy, Ni-Co alloy, etc.)

3) Ceramic compound targets (oxides, silicides, carbides, sulfides, etc.).

Our product

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Purity is one of the main performance indicators of the target, because the purity of the target has a great impact on the performance of the film, but in practical application, the purity requirements of the target are also different. Impurities in solid materials and oxygen and water vapor in pores are the main sources of film deposition. In order to reduce the porosity in the target solid and improve the performance of sputtered films, Generally, the target is required to have a high density. The density of the target affects not only the sputtering rate, but also the electrical and optical properties of the film. The higher the density of the target, the better the performance of the film. Improving the density and strength of the target can make the target better withstand the thermal stress in the sputtering process. Density is also one of the key performance indexes of the target.




Baoji Feiteng Metal materials Co., Ltd. are a manufacturer that locted in Baoji, Shaanxi. Therefore, you can customize any titanium, titanium alloy and other non-ferrous metal products. You could give us drawing, then we will manufacture according to the drawing. The price and delivery time can negotiate with us. we will be best to offer you a discount and the best delivery time. We usually use wooden cases for packing, but we can change way of packing as per your request. Please send e-mail to us if you want to know more details.



Product Titanium Tube Target
Size φ150*φ125*1091 mm
Grade Titanium Gr2
Packaging Vacuum package in wooden case
Port of delivery Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port