133mm*125mm*840mm Titanium Seamless Tube Target Corrosion Resistance

Titanium Tube Target Vacuum Coating Target 133OD*125ID*840 Seamless Tube ASTM B861-06 a

The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate technological conditions. To put it simply, the target material is the target material of high-speed charged particles bombardment. When used in high-energy laser weapons, different power densities, different output waveforms and different wavelengths of laser interact with different targets, different killing and destruction effects will be produced. For example, evaporative magnetron sputtering coating is heated evaporation coating, aluminium film, etc. Change different target materials (such as aluminium, copper, stainless steel, titanium, nickel target, etc.), can get different film systems (such as super hard, wear-resistant, anti-corrosion alloy film, etc.)
In recent years, flat panel display (FPD) has greatly impacted the computer monitor and TV market dominated by cathode ray tube (CRT), which will also drive the technology and market demand of ITO target material. There are two kinds of iTO targets today. One is sintered by mixing indium oxide and tin oxide powder in nanometer state, the other is sintered by indium tin alloy target. ITO films can be prepared by direct current reactive sputtering on indium-tin alloy targets, but the target surface will be oxidized and the sputtering rate will be affected, and it is difficult to get large size gold target. Nowadays, the first method is generally adopted to produce ITO target material, using L}IRF reactive sputtering coating. It has a fast deposition rate. And can accurately control the thickness of the film, high conductivity, good consistency of the film, strong adhesion to the substrate and other advantages l. But making targets is difficult because indium oxide and tin oxide do not sinter together easily. Generally, ZrO2, Bi2O3 and CeO are used as sintering additives, and target materials with densities of 93%~98% of the theoretical value can be obtained. The performance of ITO films formed in this way is greatly related to the additives. Japanese scientists used Bizo as an additive, And Bi2O3 melted at 820Cr, and part of the sintering temperature beyond L500 ℃ was volatilized, so that relatively pure ITO target could be obtained under liquid phase sintering conditions. And the oxide raw material is not necessarily nanoparticles, which can simplify the early process. The resistivity of ITO film obtained by using such targets as Chuan is 8.1 ×10n-cm, which is close to the resistivity of pure ITO film. The size of FPD and conductive glass are quite hot, and the width of conductive glass can even reach 3133_. In order to improve the utilization rate of the target, ITO targets of different shapes, such as cylindrical, have been developed. In 2000, the State Development Planning Commission and the Ministry of Science and Technology included ITO large targets in the Guide to Key Fields of Information Industry with Priority for Current Development.

Features

1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance